Changes in the near-surface stress in titanium caused by krypton ion-implantation
Master Thesis
2006
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University of Cape Town
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Abstract
In this work, the effect of krypton implantation on the morphology of titanium samples is investigated through scanning electron microscopy (SEM). Rutherford backscattering spectrometry (RBS) was also used to determine the dose and depth of implanted krypton. The krypton profiile in titanium, and the associated damage profile, was modelled with TRIM calculations. In addition, metallurgical techniques were also used to examine the microstructure details of the as-received, unimplanted titanium sample.
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Word processed copy.
Includes bibliographical references.
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Tunde, R. 2006. Changes in the near-surface stress in titanium caused by krypton ion-implantation. University of Cape Town.