Development of a plasma source ion implantation facility for the modification of materials' surfaces

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dc.contributor.advisorProzesky, Victor Men_ZA
dc.contributor.advisorComrie, Craig Men_ZA
dc.contributor.advisorAlport, Michael Jen_ZA
dc.contributor.authorMeyer, Kevin Alanen_ZA
dc.date.accessioned2014-08-13T20:08:22Z
dc.date.available2014-08-13T20:08:22Z
dc.date.issued2001en_ZA
dc.descriptionBibliography: p. 197-203.en_ZA
dc.description.abstractIn Plasma Source Ion Implantation high energy [10-50 keV] plasma ions are implanted into materials to modify surface properties, achieving surface hardening, increased wear and corrosion resistance. Plasma Source Ion Implantation is alos used for doping semiconductors and could form an essential step in the manufacture of multilayered wafers. This thesis describes the development and construction of the plasma implantation facility at the Materials Research Group of the Naitonal Accelerator Centre; in particular, the development of the Plasma Assisted Materials Modification Laboratory, the analytical tools available at the Materials Research Group and surrounding universities, basic research into the implantation of steels, the x-rays emitted as a side-effect of plasma source ion implantation and the development of an analytical technique of interest to silicon wafer-cutting technologies.en_ZA
dc.identifier.apacitationMeyer, K. A. (2001). <i>Development of a plasma source ion implantation facility for the modification of materials' surfaces</i>. (Thesis). University of Cape Town ,Faculty of Science ,Department of Physics. Retrieved from http://hdl.handle.net/11427/6538en_ZA
dc.identifier.chicagocitationMeyer, Kevin Alan. <i>"Development of a plasma source ion implantation facility for the modification of materials' surfaces."</i> Thesis., University of Cape Town ,Faculty of Science ,Department of Physics, 2001. http://hdl.handle.net/11427/6538en_ZA
dc.identifier.citationMeyer, K. 2001. Development of a plasma source ion implantation facility for the modification of materials' surfaces. University of Cape Town.en_ZA
dc.identifier.ris TY - Thesis / Dissertation AU - Meyer, Kevin Alan AB - In Plasma Source Ion Implantation high energy [10-50 keV] plasma ions are implanted into materials to modify surface properties, achieving surface hardening, increased wear and corrosion resistance. Plasma Source Ion Implantation is alos used for doping semiconductors and could form an essential step in the manufacture of multilayered wafers. This thesis describes the development and construction of the plasma implantation facility at the Materials Research Group of the Naitonal Accelerator Centre; in particular, the development of the Plasma Assisted Materials Modification Laboratory, the analytical tools available at the Materials Research Group and surrounding universities, basic research into the implantation of steels, the x-rays emitted as a side-effect of plasma source ion implantation and the development of an analytical technique of interest to silicon wafer-cutting technologies. DA - 2001 DB - OpenUCT DP - University of Cape Town LK - https://open.uct.ac.za PB - University of Cape Town PY - 2001 T1 - Development of a plasma source ion implantation facility for the modification of materials' surfaces TI - Development of a plasma source ion implantation facility for the modification of materials' surfaces UR - http://hdl.handle.net/11427/6538 ER - en_ZA
dc.identifier.urihttp://hdl.handle.net/11427/6538
dc.identifier.vancouvercitationMeyer KA. Development of a plasma source ion implantation facility for the modification of materials' surfaces. [Thesis]. University of Cape Town ,Faculty of Science ,Department of Physics, 2001 [cited yyyy month dd]. Available from: http://hdl.handle.net/11427/6538en_ZA
dc.language.isoengen_ZA
dc.publisher.departmentDepartment of Physicsen_ZA
dc.publisher.facultyFaculty of Scienceen_ZA
dc.publisher.institutionUniversity of Cape Town
dc.subject.otherPhysicsen_ZA
dc.titleDevelopment of a plasma source ion implantation facility for the modification of materials' surfacesen_ZA
dc.typeDoctoral Thesis
dc.type.qualificationlevelDoctoral
dc.type.qualificationnamePhDen_ZA
uct.type.filetypeText
uct.type.filetypeImage
uct.type.publicationResearchen_ZA
uct.type.resourceThesisen_ZA
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