Light induced degradation in hydrogenated amorphous silicon (a-Si:H)
Master Thesis
2005
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University of Cape Town
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Abstract
Light induced degradation in the microstructure and optical properties of a series of hydrogenated amorphous silicon (a-Si:H) layers, deposited by hot wire chemical vapour deposition system (HWCVD) on glass and silicon substrates at different temperatures ranging from 250Light induced degradation in the microstructure and optical properties of a series of hydrogenated amorphous silicon (a-Si:H) layers, deposited by hot wire chemical vapour deposition system (HWCVD) on glass and silicon substrates at different temperatures ranging from 250°C to 500°C are investigated. Light soaking experiments were carried out using a mirrored chamber with a metal halide lamp.
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Includes bibliographical references (leaves 73-77).
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Sigcau, Z. 2005. Light induced degradation in hydrogenated amorphous silicon (a-Si:H). University of Cape Town.