The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5

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dc.contributor.advisorMöller, Klausen_ZA
dc.contributor.advisorO'Connor, Cyrilen_ZA
dc.contributor.authorManstein, Heikoen_ZA
dc.date.accessioned2014-07-31T11:07:25Z
dc.date.available2014-07-31T11:07:25Z
dc.date.issued2001en_ZA
dc.descriptionBibliography: leaves 119-124.
dc.description.abstractThis thesis reports on the investigation of a cyclic chemical vapour deposition (CVD) method eliminating unwanted surface reactions and enhancing shape selective properties by depositing inert silica onto the external surface of zeolite ZSM-5. A CVD treatment consists out of a deposition, flushing and heating step followed by calcination in flowing air. Modifications are carried out in up to 33 cycles on one and the same sample employing tetraethoxysilane (TEOS) as silica precursor at deposition temperatures ranging from 50 to 400°C. After each CVD treatment the catalyst is tested with appropriate test reactions in order to quantify the extent of modification. The gradual inertisation of the external surface is followed with the catalytic cracking of 1,3,5-triisopropylbenzene (1,3,5-TiPB) which is too bulky to enter the micro-pore structure of ZSM-5. The disproportination of toluene (TDP) is employed to monitor changes of the internal activity and alterations in the shape selective properties of the catalyst. The analysis of reactor effluent during the deposition, flushing and heating step of the modification cycle allows investingating the reaction pathway. The deposition reaction proceeds with the reaction of the alkoxy groups of TEOS with the terminal hydroxyls of the zeolite under the formation of ethanol.en_ZA
dc.identifier.apacitationManstein, H. (2001). <i>The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5</i>. (Thesis). University of Cape Town ,Faculty of Engineering & the Built Environment ,Department of Chemical Engineering. Retrieved from http://hdl.handle.net/11427/5290en_ZA
dc.identifier.chicagocitationManstein, Heiko. <i>"The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5."</i> Thesis., University of Cape Town ,Faculty of Engineering & the Built Environment ,Department of Chemical Engineering, 2001. http://hdl.handle.net/11427/5290en_ZA
dc.identifier.citationManstein, H. 2001. The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5. University of Cape Town.en_ZA
dc.identifier.ris TY - Thesis / Dissertation AU - Manstein, Heiko AB - This thesis reports on the investigation of a cyclic chemical vapour deposition (CVD) method eliminating unwanted surface reactions and enhancing shape selective properties by depositing inert silica onto the external surface of zeolite ZSM-5. A CVD treatment consists out of a deposition, flushing and heating step followed by calcination in flowing air. Modifications are carried out in up to 33 cycles on one and the same sample employing tetraethoxysilane (TEOS) as silica precursor at deposition temperatures ranging from 50 to 400°C. After each CVD treatment the catalyst is tested with appropriate test reactions in order to quantify the extent of modification. The gradual inertisation of the external surface is followed with the catalytic cracking of 1,3,5-triisopropylbenzene (1,3,5-TiPB) which is too bulky to enter the micro-pore structure of ZSM-5. The disproportination of toluene (TDP) is employed to monitor changes of the internal activity and alterations in the shape selective properties of the catalyst. The analysis of reactor effluent during the deposition, flushing and heating step of the modification cycle allows investingating the reaction pathway. The deposition reaction proceeds with the reaction of the alkoxy groups of TEOS with the terminal hydroxyls of the zeolite under the formation of ethanol. DA - 2001 DB - OpenUCT DP - University of Cape Town LK - https://open.uct.ac.za PB - University of Cape Town PY - 2001 T1 - The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5 TI - The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5 UR - http://hdl.handle.net/11427/5290 ER - en_ZA
dc.identifier.urihttp://hdl.handle.net/11427/5290
dc.identifier.vancouvercitationManstein H. The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5. [Thesis]. University of Cape Town ,Faculty of Engineering & the Built Environment ,Department of Chemical Engineering, 2001 [cited yyyy month dd]. Available from: http://hdl.handle.net/11427/5290en_ZA
dc.language.isoengen_ZA
dc.publisher.departmentDepartment of Chemical Engineeringen_ZA
dc.publisher.facultyFaculty of Engineering and the Built Environment
dc.publisher.institutionUniversity of Cape Town
dc.subject.otherChemical Engineeringen_ZA
dc.titleThe chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5en_ZA
dc.typeDoctoral Thesis
dc.type.qualificationlevelDoctoral
dc.type.qualificationnamePhDen_ZA
uct.type.filetypeText
uct.type.filetypeImage
uct.type.publicationResearchen_ZA
uct.type.resourceThesisen_ZA
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