Marker studies of nickel silicide formation

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dc.contributor.advisorComrie, Craig Men_ZA
dc.contributor.advisorPretorius, Ren_ZA
dc.contributor.authorMcLeod, John Edwarden_ZA
dc.date.accessioned2015-12-20T15:43:47Z
dc.date.available2015-12-20T15:43:47Z
dc.date.issued1988en_ZA
dc.descriptionIncludes bibliographical references.en_ZA
dc.description.abstractAtomic diffusion during the solid state formation of thin films of nickel silicides (Ni2Si and NiSi) from nickel and amorphous silicon has been investigated using 31Si radioactive tracer and inert marker techniques. Samples were prepared by vacuum deposition of thin films of nickel and silicon, followed by thermal annealing to effect silicide growth. The radioactive tracer investigation of Ni2Si showed nickel to be the diffusing species during silicide growth. Sharply defined Ni2si* profiles of 100% radioactive concentration at the sample surface were - obtained. The results are compared with previous results in which the profiles were more spread out and of lower surface concentration. The radioactive tracer investigation of NiSi formation showed that nickel is also the diffusing species during second phase growth. The NiSi * layer was found to be of 100% concentration. Some spreading of the activity profile near the NiSi/NiSi* interface was observed. The results were consistent with previous 31Si tracer work on NiSi formation and also with the present Ni * 2Si results. The inert marker investigation used an ultra-thin (5-10 A) continuous layer of Mo or Ta to monitor atomic movement during silicide growth. The results confirmed nickel to be the diffusing species during the growth of both phases. These results are in excellent agreement with previous inert marker studies of nickel silicide growth.en_ZA
dc.identifier.apacitationMcLeod, J. E. (1988). <i>Marker studies of nickel silicide formation</i>. (Thesis). University of Cape Town ,Faculty of Science ,Department of Physics. Retrieved from http://hdl.handle.net/11427/15903en_ZA
dc.identifier.chicagocitationMcLeod, John Edward. <i>"Marker studies of nickel silicide formation."</i> Thesis., University of Cape Town ,Faculty of Science ,Department of Physics, 1988. http://hdl.handle.net/11427/15903en_ZA
dc.identifier.citationMcLeod, J. 1988. Marker studies of nickel silicide formation. University of Cape Town.en_ZA
dc.identifier.ris TY - Thesis / Dissertation AU - McLeod, John Edward AB - Atomic diffusion during the solid state formation of thin films of nickel silicides (Ni2Si and NiSi) from nickel and amorphous silicon has been investigated using 31Si radioactive tracer and inert marker techniques. Samples were prepared by vacuum deposition of thin films of nickel and silicon, followed by thermal annealing to effect silicide growth. The radioactive tracer investigation of Ni2Si showed nickel to be the diffusing species during silicide growth. Sharply defined Ni2si* profiles of 100% radioactive concentration at the sample surface were - obtained. The results are compared with previous results in which the profiles were more spread out and of lower surface concentration. The radioactive tracer investigation of NiSi formation showed that nickel is also the diffusing species during second phase growth. The NiSi * layer was found to be of 100% concentration. Some spreading of the activity profile near the NiSi/NiSi* interface was observed. The results were consistent with previous 31Si tracer work on NiSi formation and also with the present Ni * 2Si results. The inert marker investigation used an ultra-thin (5-10 A) continuous layer of Mo or Ta to monitor atomic movement during silicide growth. The results confirmed nickel to be the diffusing species during the growth of both phases. These results are in excellent agreement with previous inert marker studies of nickel silicide growth. DA - 1988 DB - OpenUCT DP - University of Cape Town LK - https://open.uct.ac.za PB - University of Cape Town PY - 1988 T1 - Marker studies of nickel silicide formation TI - Marker studies of nickel silicide formation UR - http://hdl.handle.net/11427/15903 ER - en_ZA
dc.identifier.urihttp://hdl.handle.net/11427/15903
dc.identifier.vancouvercitationMcLeod JE. Marker studies of nickel silicide formation. [Thesis]. University of Cape Town ,Faculty of Science ,Department of Physics, 1988 [cited yyyy month dd]. Available from: http://hdl.handle.net/11427/15903en_ZA
dc.language.isoengen_ZA
dc.publisher.departmentDepartment of Physicsen_ZA
dc.publisher.facultyFaculty of Scienceen_ZA
dc.publisher.institutionUniversity of Cape Town
dc.subject.otherPhysicsen_ZA
dc.subject.otherSilicidesen_ZA
dc.subject.otherNickel compoundsen_ZA
dc.subject.otherTracers (Chemistry)en_ZA
dc.subject.otherBiochemical markersen_ZA
dc.titleMarker studies of nickel silicide formationen_ZA
dc.typeMaster Thesis
dc.type.qualificationlevelMasters
dc.type.qualificationnameMScen_ZA
uct.type.filetypeText
uct.type.filetypeImage
uct.type.publicationResearchen_ZA
uct.type.resourceThesisen_ZA
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