The formation of epitaxially stabilized nickel and cobalt silicides by pulsed laser annealing

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dc.contributor.advisorComrie, Craigen_ZA
dc.contributor.authorKubeka, Thulani Men_ZA
dc.date.accessioned2014-08-13T20:08:10Z
dc.date.available2014-08-13T20:08:10Z
dc.date.issued2001en_ZA
dc.descriptionBibliography: leaves 56-58.en_ZA
dc.description.abstractThe formation of epitaxially stabilised nickel and cobalt silicides by pulsed laser annealing has been investigated. Thermally grown NiSi and CoSi and Si<111> substrate were irradiated with laser pulses in the energy density range between 0.4 - 1.0 J/cm² in an attempt to produce epitaxially stabilized silicides. The analysis was carried out using well established RBS and channelling techniques. In the bulk form, and in thin films, NiSi has an orthorhombic MnP crystal structure and cannot grow epitaxially on the cubic silicon substrate and channelling is nto observed in the silicides thus prepared. Since NiSi melts at a temperature 400°C below silicon, it is possible to melt the whole NiSi film without melting the substrate. The presence of channelling in the NiSi film observed after laser annealing at lower energy densities was an indication that complete melting of the film had occured allowing for re-ordering of atoms in the melt.en_ZA
dc.identifier.apacitationKubeka, T. M. (2001). <i>The formation of epitaxially stabilized nickel and cobalt silicides by pulsed laser annealing</i>. (Thesis). University of Cape Town ,Faculty of Science ,Department of Physics. Retrieved from http://hdl.handle.net/11427/6532en_ZA
dc.identifier.chicagocitationKubeka, Thulani M. <i>"The formation of epitaxially stabilized nickel and cobalt silicides by pulsed laser annealing."</i> Thesis., University of Cape Town ,Faculty of Science ,Department of Physics, 2001. http://hdl.handle.net/11427/6532en_ZA
dc.identifier.citationKubeka, T. 2001. The formation of epitaxially stabilized nickel and cobalt silicides by pulsed laser annealing. University of Cape Town.en_ZA
dc.identifier.ris TY - Thesis / Dissertation AU - Kubeka, Thulani M AB - The formation of epitaxially stabilised nickel and cobalt silicides by pulsed laser annealing has been investigated. Thermally grown NiSi and CoSi and Si<111> substrate were irradiated with laser pulses in the energy density range between 0.4 - 1.0 J/cm² in an attempt to produce epitaxially stabilized silicides. The analysis was carried out using well established RBS and channelling techniques. In the bulk form, and in thin films, NiSi has an orthorhombic MnP crystal structure and cannot grow epitaxially on the cubic silicon substrate and channelling is nto observed in the silicides thus prepared. Since NiSi melts at a temperature 400°C below silicon, it is possible to melt the whole NiSi film without melting the substrate. The presence of channelling in the NiSi film observed after laser annealing at lower energy densities was an indication that complete melting of the film had occured allowing for re-ordering of atoms in the melt. DA - 2001 DB - OpenUCT DP - University of Cape Town LK - https://open.uct.ac.za PB - University of Cape Town PY - 2001 T1 - The formation of epitaxially stabilized nickel and cobalt silicides by pulsed laser annealing TI - The formation of epitaxially stabilized nickel and cobalt silicides by pulsed laser annealing UR - http://hdl.handle.net/11427/6532 ER - en_ZA
dc.identifier.urihttp://hdl.handle.net/11427/6532
dc.identifier.vancouvercitationKubeka TM. The formation of epitaxially stabilized nickel and cobalt silicides by pulsed laser annealing. [Thesis]. University of Cape Town ,Faculty of Science ,Department of Physics, 2001 [cited yyyy month dd]. Available from: http://hdl.handle.net/11427/6532en_ZA
dc.language.isoengen_ZA
dc.publisher.departmentDepartment of Physicsen_ZA
dc.publisher.facultyFaculty of Scienceen_ZA
dc.publisher.institutionUniversity of Cape Town
dc.subject.otherPhysicsen_ZA
dc.titleThe formation of epitaxially stabilized nickel and cobalt silicides by pulsed laser annealingen_ZA
dc.typeMaster Thesis
dc.type.qualificationlevelMasters
dc.type.qualificationnameMScen_ZA
uct.type.filetypeText
uct.type.filetypeImage
uct.type.publicationResearchen_ZA
uct.type.resourceThesisen_ZA
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