On the nucleation of PdSi and NiSi 2 during the ternary Ni(Pd)/Si(100) reaction

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dc.contributor.authorSchrauwen, A
dc.contributor.authorDemeulemeester, J
dc.contributor.authorKumar, A
dc.contributor.authorVandervorst, W
dc.contributor.authorComrie, C M
dc.contributor.authorDetavernier, C
dc.contributor.authorTemst, K
dc.contributor.authorVantomme, A
dc.date.accessioned2021-10-08T07:04:25Z
dc.date.available2021-10-08T07:04:25Z
dc.date.issued2013
dc.description.abstractDuring the solid phase reaction of a Ni(Pd) alloy with Si(100), phase separation of binary Ni- and Pd-silicides occurs. The PdSi monosilicide nucleates at temperatures significantly below the widely accepted nucleation temperature of the binary system. The decrease in nucleation temperature originates from the presence of the isomorphous NiSi, lowering the interface energy for PdSi nucleation. Despite the mutual solubility of NiSi and PdSi, the two binaries coexist in a temperature window of 100 °C. Only above 700 °C a Ni 1– x Pd x Si solid solution is formed, which in turn postpones the NiSi2 formation to a higher temperature due to entropy of mixing. Our findings highlight the overall importance of the interface energy for nucleation in ternary systems.
dc.identifier.apacitationSchrauwen, A., Demeulemeester, J., Kumar, A., Vandervorst, W., Comrie, C. M., Detavernier, C., ... Vantomme, A. (2013). On the nucleation of PdSi and NiSi 2 during the ternary Ni(Pd)/Si(100) reaction. <i>Journal of Applied Physics</i>, 114(6), 63518 - 177. http://hdl.handle.net/11427/34500en_ZA
dc.identifier.chicagocitationSchrauwen, A, J Demeulemeester, A Kumar, W Vandervorst, C M Comrie, C Detavernier, K Temst, and A Vantomme "On the nucleation of PdSi and NiSi 2 during the ternary Ni(Pd)/Si(100) reaction." <i>Journal of Applied Physics</i> 114, 6. (2013): 63518 - 177. http://hdl.handle.net/11427/34500en_ZA
dc.identifier.citationSchrauwen, A., Demeulemeester, J., Kumar, A., Vandervorst, W., Comrie, C.M., Detavernier, C., Temst, K. & Vantomme, A. et al. 2013. On the nucleation of PdSi and NiSi 2 during the ternary Ni(Pd)/Si(100) reaction. <i>Journal of Applied Physics.</i> 114(6):63518 - 177. http://hdl.handle.net/11427/34500en_ZA
dc.identifier.issn0021-8979
dc.identifier.issn1089-7550
dc.identifier.issn1520-8850
dc.identifier.ris TY - Journal Article AU - Schrauwen, A AU - Demeulemeester, J AU - Kumar, A AU - Vandervorst, W AU - Comrie, C M AU - Detavernier, C AU - Temst, K AU - Vantomme, A AB - During the solid phase reaction of a Ni(Pd) alloy with Si(100), phase separation of binary Ni- and Pd-silicides occurs. The PdSi monosilicide nucleates at temperatures significantly below the widely accepted nucleation temperature of the binary system. The decrease in nucleation temperature originates from the presence of the isomorphous NiSi, lowering the interface energy for PdSi nucleation. Despite the mutual solubility of NiSi and PdSi, the two binaries coexist in a temperature window of 100 °C. Only above 700 °C a Ni 1– x Pd x Si solid solution is formed, which in turn postpones the NiSi2 formation to a higher temperature due to entropy of mixing. Our findings highlight the overall importance of the interface energy for nucleation in ternary systems. DA - 2013 DB - OpenUCT DP - University of Cape Town IS - 6 J1 - Journal of Applied Physics LK - https://open.uct.ac.za PY - 2013 SM - 0021-8979 SM - 1089-7550 SM - 1520-8850 T1 - On the nucleation of PdSi and NiSi 2 during the ternary Ni(Pd)/Si(100) reaction TI - On the nucleation of PdSi and NiSi 2 during the ternary Ni(Pd)/Si(100) reaction UR - http://hdl.handle.net/11427/34500 ER - en_ZA
dc.identifier.urihttp://hdl.handle.net/11427/34500
dc.identifier.vancouvercitationSchrauwen A, Demeulemeester J, Kumar A, Vandervorst W, Comrie CM, Detavernier C, et al. On the nucleation of PdSi and NiSi 2 during the ternary Ni(Pd)/Si(100) reaction. Journal of Applied Physics. 2013;114(6):63518 - 177. http://hdl.handle.net/11427/34500.en_ZA
dc.language.isoeng
dc.publisher.departmentDepartment of Physics
dc.publisher.facultyFaculty of Science
dc.sourceJournal of Applied Physics
dc.source.journalissue6
dc.source.journalvolume114
dc.source.pagination63518 - 177
dc.source.urihttps://dx.doi.org/10.1063/1.4818333
dc.subject.otherChemistry
dc.subject.otherNI
dc.subject.other(111)SI
dc.subject.otherTHIN-FILMS
dc.subject.otherMIXING ENTROPY
dc.subject.otherTHERMAL-STABILITY
dc.subject.otherSILICIDE FORMATION
dc.subject.otherPHASE-TRANSFORMATION
dc.subject.otherBILAYERS
dc.subject.otherDIFFUSION
dc.titleOn the nucleation of PdSi and NiSi 2 during the ternary Ni(Pd)/Si(100) reaction
dc.typeJournal Article
uct.type.publicationResearch
uct.type.resourceJournal Article
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