Laser induced epitaxy of Ni and Co silicides

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dc.contributor.advisorComrie, Craig Men_ZA
dc.contributor.authorSchroeder, Brett Roberten_ZA
dc.date.accessioned2015-12-28T06:12:16Z
dc.date.available2015-12-28T06:12:16Z
dc.date.issued1995en_ZA
dc.descriptionIncludes bibliographical references.en_ZA
dc.description.abstractLaser annealing of metal layers on silicon substrates failed to produce uniform silicide layers. This can be attributed to constitutional supercooling effects. Laser annealing of thermally grown monosilicides gave low (~5%) minimum yields for Co and Ni on <111> substrates1 as well as Ni on <100> substrates. The best yield achieved for Co on <100> substrates is 35%. The formation of a non-equilibrium epitaxial monosilicide was also achieved. Numerical calculations based on a heat flow approach gave fair quantitative agreement with experiment.en_ZA
dc.identifier.apacitationSchroeder, B. R. (1995). <i>Laser induced epitaxy of Ni and Co silicides</i>. (Thesis). University of Cape Town ,Faculty of Science ,Department of Physics. Retrieved from http://hdl.handle.net/11427/16013en_ZA
dc.identifier.chicagocitationSchroeder, Brett Robert. <i>"Laser induced epitaxy of Ni and Co silicides."</i> Thesis., University of Cape Town ,Faculty of Science ,Department of Physics, 1995. http://hdl.handle.net/11427/16013en_ZA
dc.identifier.citationSchroeder, B. 1995. Laser induced epitaxy of Ni and Co silicides. University of Cape Town.en_ZA
dc.identifier.ris TY - Thesis / Dissertation AU - Schroeder, Brett Robert AB - Laser annealing of metal layers on silicon substrates failed to produce uniform silicide layers. This can be attributed to constitutional supercooling effects. Laser annealing of thermally grown monosilicides gave low (~5%) minimum yields for Co and Ni on <111> substrates1 as well as Ni on <100> substrates. The best yield achieved for Co on <100> substrates is 35%. The formation of a non-equilibrium epitaxial monosilicide was also achieved. Numerical calculations based on a heat flow approach gave fair quantitative agreement with experiment. DA - 1995 DB - OpenUCT DP - University of Cape Town LK - https://open.uct.ac.za PB - University of Cape Town PY - 1995 T1 - Laser induced epitaxy of Ni and Co silicides TI - Laser induced epitaxy of Ni and Co silicides UR - http://hdl.handle.net/11427/16013 ER - en_ZA
dc.identifier.urihttp://hdl.handle.net/11427/16013
dc.identifier.vancouvercitationSchroeder BR. Laser induced epitaxy of Ni and Co silicides. [Thesis]. University of Cape Town ,Faculty of Science ,Department of Physics, 1995 [cited yyyy month dd]. Available from: http://hdl.handle.net/11427/16013en_ZA
dc.language.isoengen_ZA
dc.publisher.departmentDepartment of Physicsen_ZA
dc.publisher.facultyFaculty of Scienceen_ZA
dc.publisher.institutionUniversity of Cape Town
dc.subject.otherPhysicsen_ZA
dc.titleLaser induced epitaxy of Ni and Co silicidesen_ZA
dc.typeMaster Thesis
dc.type.qualificationlevelMasters
dc.type.qualificationnameMScen_ZA
uct.type.filetypeText
uct.type.filetypeImage
uct.type.publicationResearchen_ZA
uct.type.resourceThesisen_ZA
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